Vacuum Spin Coater

Spin coating is a method of quickly applying a uniform layer of a thin film onto a substrate. By dispensing a coating material on a rotating substrate, a thin film is created.

Vacuum creates a low pressure environment which aids in the elimination of air bubbles and hence ensures uniform deposition of the thin film. It also provides you with precision control over film thickness when you are using complex substrates for coating. The vacuum surroundings also reduce contamination, thereby enhancing the adhesion of deposited films.

You should always make sure that the choice of your substrate has compatibility with your coating material to ensure uniform adhesion between them.

Thin films of various materials such as Polymers (Both Conducting and Insulating polymers, Photoresists), Metals (Gold, Aluminium, Platinum), Oxides (Silicon, Titanium, Zinc oxides), Semiconductors (Sillicon, Gallium Arsenide, Cadmium Sulfide), Dielectrics (Alumina, Hafnium oxide), Organic dyes, Nanomaterials (Carbon nanotubes, Graphene, Quantum dots) and Functional coatings (Hydrophilic/ Hydrophobic Coating, Anti-Reflective Coating) can be spin coated unto a substrate.

It was primarily used in semiconductor manufacturing industry and research laboratories to create a thin film on a given substrate. But this technique has extended its arms to modern arenas like Microelectromechanical systems (MEMS), Dye-sensitized solar cells (DSSCs), Nanotechnology etc.