Vacuum Spin Coater LVSC-A10

The maximum substrate or wafer size that can be used by our spin coater to effectively coat with a uniform thin film is 4 inches.

We provide a standard vacuum chuck/plate of size 100 mm. But along with that, there are several optional sizes available on your demand ranging from 150 mm to 300 mm.

Our product is incorporated with the latest type of brushless motor which reduces the friction and heat generation resulting in increased efficiency of coating. This in turn leads to noiseless operation and zero maintenance costs, saving your time and efforts.

Our 5-step programmable control allows you to execute even complex coating processes in an order of 5 distinct operational steps. This gives you precise management over each of the 5 steps which can be individually programmed with specific parameters like spin speed, acceleration/deceleration rates, and duration. We provide you with control over spin speed and acceleration rate in a very broad range of 100 to 10000 rpm and control over duration for a maximum time of 3000 seconds.

Spin coating is a method of quickly applying a uniform layer of a thin film onto a substrate. By dispensing a coating material on a rotating substrate, a thin film is created.

Vacuum creates a low pressure environment which aids in the elimination of air bubbles and hence ensures uniform deposition of the thin film. It also provides you with precision control over film thickness when you are using complex substrates for coating. The vacuum surroundings also reduce contamination, thereby enhancing the adhesion of deposited films.

You should always make sure that the choice of your substrate has compatibility with your coating material to ensure uniform adhesion between them.

Thin films of various materials such as Polymers (Both Conducting and Insulating polymers, Photoresists), Metals (Gold, Aluminium, Platinum), Oxides (Silicon, Titanium, Zinc oxides), Semiconductors (Sillicon, Gallium Arsenide, Cadmium Sulfide), Dielectrics (Alumina, Hafnium oxide), Organic dyes, Nanomaterials (Carbon nanotubes, Graphene, Quantum dots) and Functional coatings (Hydrophilic/ Hydrophobic Coating, Anti-Reflective Coating) can be spin coated unto a substrate.

It was primarily used in semiconductor manufacturing industry and research laboratories to create a thin film on a given substrate. But this technique has extended its arms to modern arenas like Microelectromechanical systems (MEMS), Dye-sensitized solar cells (DSSCs), Nanotechnology etc.