E-Beam Evaporator

E-Beam Evaporator features an electron beam gun with variable power, ensuring precise control of evaporation rate and layer uniformity. They operate within an ultra-high vacuum chamber for a clean deposition environment, producing high-purity films. An advanced coating thickness monitor is present for real-time film thickness monitoring. They support a wide range of materials, including metals, dielectrics, and semiconductors. Our e-beam evaporator are integrated with safety features to protect both the operator and the instrument.