Atomic Absorption Spectrophotometer LAAS-A11 operates at wavelengths between 190 and 900 nm. It is a dual-beam source system that assists in identifying trace elements. Equipped with deuterium lamp that enhances accuracy by reducing background scatter. No cathode lamp pre-heating speeds up sample analysis. Enables quick sample analysis, crucial for high-volume testing. Its High-energy optical path boosts sensitivity and accuracy in measurements. Our spectrophotometer compensates for circuit drift, ensuring stable results.
Request Quote| Wavelength Range | 190 to 900 nm |
| Spectral Bandwidth | 0.2 nm, 0.4 nm, 0.7 nm, 1.4 nm, 2.4 nm, 5.0 nm |
| Wavelength Accuracy | ≤ ± 0.5 nm |
| Wavelength Repeatability | ≤ 0.3 nm (single direction) |
| Baseline Drift | ± 0.004 Abs / 30 min |
| Resolution | < 40 % |
| Characteristic Concentration (Cu) | ≤ 0.04 mg / ml / 1 % |
| Detection Limit (Cu) | 0.008 mg/ml |
| Background Calibration Ability | Greater than 30 times |
| Power | 220 V / 3 A, 50 Hz |
| Dimension | 1220 × 770 × 730 mm |
| Weight | 160 Kg |
Atomic Absorption Spectrophotometer is utilized across various sectors including environmental analysis, geology, metallurgy, petrochemical industries, food and beverages, medicines, ceramics, paints, and chemical industries for precise quantification of specific elements.
A graphite furnace system
| Model | Wavelength Range | Spectral Bandwidth | Wavelength Accuracy | Wavelength Repeatability | Baseline Drift | Resolution | Characteristic Concentration (Cu) | Detection Limit (Cu) | Background Calibration Ability | Power | Dimension | Weight |
| LAAS-A23 | - | 0.1 nm,0.2 nm,0.4 nm, 0.7 nm, 1.0 nm, 1.4 nm, 2.0 nm automatic setting | - | - | - | - | - | 0.002 μg/mL | - | - | - | - |
| LAAS-A20 | - | 0, 0.2, 0.4, 1.0, 2.0nm (Automatic setting) | - | - | - | - | - | 0.002 μg/mL | - | - | - | - |
| LAAS-A21 | - | 0 nm, 0.2 nm, 0.4 nm, 1.0 nm, 2.0 nm (5 steps with automatic changeover) | - | - | - | - | - | 0.002 μg/mL | - | - | - | - |
| LAAS-A22 | - | 0.1 nm,0.2 nm,0.4 nm, 1.0 nm, 2.0 nm automatic setting | - | - | - | - | - | 0.002 μg/mL | - | - | - | - |
| LAAS-A11 | 190 to 900 nm | 0.2 nm, 0.4 nm, 0.7 nm, 1.4 nm, 2.4 nm, 5.0 nm | ≤ ± 0.5 nm | ≤ 0.3 nm (single direction) | ± 0.004 Abs / 30 min | < 40 % | ≤ 0.04 mg / ml / 1 % | 0.008 mg/ml | Greater than 30 times | 220 V / 3 A, 50 Hz | 1220 × 770 × 730 mm | 160 Kg |
| LAAS-A13 | - | 0.1, 0.2, 0.4, 1.0 and 2.0 nm | ± 0.15 nm | ≤ 0.04 nm | - | - | - | - | - | 220 V ± 22 V AC | 700 × 550 × 450 mm | 75 Kg |
| LAAS-A12 | 190 to 900 nm | 0.1 nm, 0.2 nm, 1.0 nm, 2.0 nm | ± 0.25 nm | 0.15 nm | - | - | - | - | - | AC 220 V / 50 Hz | 1000 × 350 × 390 mm | 70 Kg |
