Request A Quote
Plasma Sputtering Coater LPSC-A10

Plasma Sputtering Coater LPSC-A10

Plasma Sputtering Coater LPSC-A10 ensures uniform coating with a 100 mm rotatable sample stage and an adjustable rotation speed of 1rpm to 20 rpm. It features a PLC touch screen interface, offering a user-friendly operation. The low temperature plasma process prevents thermal damage for sensitive samples. Its two-staged sputtering method increases its efficiency to deposit thin metal layers. Our coater provides precise coatings with low thermal effect.

Plasma Sputtering Coater LPSC-A10
Plasma Sputtering Coater LPSC-A10
Plasma Sputtering Coater LPSC-A10
Request Quote
Sample Stage Size 100 mm
Sample Stage Rotating Speed 1 to 20 rpm adjustable
Sample Stage To Target Surface Distance 20 to 25 mm height (adjustable)
Plasma Sputtering Source Quantity 2 inches x 1 target
Plasma Sputtering Source Cooling Method Natural cooling
Vacuum Chamber Size Ф 180 × 150 mm
Vacuum Chamber Observation Window Omnidirectional visibility
Vacuum Chamber Material High purity quartz
Vacuum Chamber Open Method Top cover removable
Vacuum Chamber Cover Material (Upper And Lower) 304 SUS
Vacuum Chamber Pumping Port KF25
Vacuum Chamber Intake Port 1/4 inch ferrule connector
Vacuum System Pump Type Dual-stage rotary vane vacuum pump
Vacuum System Pumping Rate 1.1 L/s (4 m³/h)
Vacuum System Ultimate Vacuum Pressure ≥ 0.1 Pa
Vacuum System Vacuum Measurement Resistance vacuum gauge
Vacuum System Pumping Port KF25
Vacuum System Exhaust Interface KF16
Plasma Sputtering Power Supply 3000 V, DC
Output Power of DC Power Supply ≤ 150 W
Maximum Sputtering Current 0.05 A
Power Supply AC 220 V, 50 Hz
Total Power 1.5 kW/ 2 kW
Dimension 550 × 450 × 450 mm
Weight 30 kg
  • High-purity quartz vacuum chamber

  • Dual-staged rotary vane vacuum pump

  • Compact size

  • Easy operation

Plasma Sputtering Coater LPSC-A10 is used in materials science, nanotechnology, electronics, semiconductor research, and sample preparation for electron microscopy.

Plasma Sputtering Coater LPSC-A10|Compact size|Easy operation

Models of Coating Machine

Labtron provides a wide range of Coating Machines such as Tablet Coating Machine, Blade Coaters, and Vacuum Spin Coaters. They ensure precise and uniform application of coatings on various substrates, enhancing product performance and quality. Their features like adjustable coating thickness, customizable speed, and advanced digital controls, make them useful for a variety of applications. These coating machines are engineered for efficiency, reliability, and consistency. Our machines are tailored to meet the unique needs of each industry, improving productivity and delivering superior results.

Magnetron Coating Machine LMMC-A13

Magnetron Coating Machine LMMC-A13

  • Sample Stage Size : Ф 150 mm
  • Sample Stage Rotating Speed : 1 to 20 rpm adjustable
  • Sample Stage Heating Temperature : ≤ 500℃
  • Temperature Control Accuracy : ± 1℃
Heating Coating Machine LHCM-A10

Heating Coating Machine LHCM-A10

  • Coating Speed : 0 to 100 mm/s
  • Coating Speed Accuracy : 10 mm/s
  • Coating Stroke : 10 to 250 mm (adjustable)
  • Heating method : Top UV (WL: 365nm) Bottom heating: 120℃
Magnetron Coating Machine LMMC-A10

Magnetron Coating Machine LMMC-A10

  • Magnetron Sputtering Head Diameter : Ф 50.8 mm
  • Magnetron Sputtering Head Thickness : ≤ 3 mm
  • Sample Stage Size : 100 mm
  • Sample Stage Rotating Speed : 1 to 20 rpm adjustable
Magnetron Coating Machine LMMC-A12
Magnetron Coating Machine LMMC-A12
  • Sample Stage Size : Ф 50 mm
  • Sample Stage Rotating Speed : 1 to 10 rpm adjustable
  • Sample Stage Heating Temperature : ≤ 500℃
  • Magnetron Sputtering Head Diameter : Ф 50.8 mm
Double-Sided Dip Coating Machine LDDM-A10
Double-Sided Dip Coating Machine LDDM-A10
  • Maximum Mechanical Speed : 1 m/min
  • Tension Magnitude : 6 to 60 N
  • Air Source : 0.5 to 0.8 MPa compressed air
  • Maximum Reel Diameter : 300 mm
Casting Drying Coater LCDC-A10

Casting Drying Coater LCDC-A10

  • Coating Speed : 10 mm/s to 100 mm/s
  • Speed Control Precision : 1 mm/sec
  • Heating Method : Top dryer
  • Heating Temperature : ≤ 120℃
Vacuum Spin Coater LVSC-A10

Vacuum Spin Coater LVSC-A10

  • Chamber Size : 134 mm
  • Maximum Wafer Diameter : 4 inch (100mm)
  • Spinning Speed Range : 100 to 10000 rpm (adjustable)
  • Acceleration Range : 100 to 10000 rpm/s
Belt Cast Film Coating Machine LBFM-A10

Belt Cast Film Coating Machine LBFM-A10

  • Traverse Speed : 10 to 80 mm/sec (variable)
  • Stroke Length : 10 to 800 mm (adjustable)
  • Platform : Aluminum alloy flat vacuum chuck
  • Vacuum chuck Dimensions : 800 × 250 × 25 mm

Need a Product

send details for best price quotation

Click
For

Labtron Equipment Ltd., Quatro House, Lyon Way, Camberley, Surrey GU16 7ER United Kingdom

Email: info@labtron.com Whatsapp: +44 73 4441 2688 Phone: +44 2080 043608

Copyright © 2026 Labtron Equipment Ltd. All rights reserved.