Magnetron Coating Machine LMMC-A13

Name: Magnetron Coating Machine LMMC-A13
Brand: Labtron
SKU: LMMC-A13
Rating: 4.8 (725 reviews)

Magnetron Coating Machine LMMC-A13 has a sample stage of Ф 150 mm which can rotate up to a speed of 20 rpm. It features two magnetron targets and DC power supplies. The system is equipped with advanced cooling for the magnetron and molecular pumps. Its dual chambers: a main chamber and a transition chamber allows for sputtering and loading samples without disrupting the vacuum. This design reduces the number of vacuum cycles, saving time.

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Sample Stage Size	Ф 150 mm
Sample Stage Rotating Speed	1 to 20 rpm adjustable
Sample Stage Heating Temperature	≤ 500℃
Temperature Control Accuracy	± 1℃
Magnetron Sputtering Head Diameter	Ф 50.8 mm
Magnetron Sputtering Head Thickness	≤ 3 mm
Magnetron Sputtering Head Cooling Mode	Circulating water cooling
Magnetron Sputtering Head Water Flow Rate	≥ 10 L/min
Vacuum Chamber Size	Ф 325 × 500 mm
Vacuum Chamber Transition Cavity	Ф 150 × 150 mm
Vacuum Chamber Material	304 SUS
Vacuum Chamber Opening Mode	Top opening
Vacuum System	Molecular pump system
Molecular Pump Pumping Rate	600 L/s
Vacuum System Pressure	≤ 5 × 10-4 Pa
Gas Control	One channel
Gas Type	Argon
Flow Rate	200 sccm
Film Thickness Meter	Quartz Crystal
Resolution	0.10 Å
Sputter Power Supply	DC 500 W
Target Power Supply Quantity	1
Overall Power Supply	AC 220V, 50Hz
Total Power	6.5 kW

Dual vacuum chambers
Automatic current and vacuum shut-off protections
Independent vacuum systems for each chamber
High sputtering power
Stainless steel construction for durability

Magnetron Coating Machine LMMC-A13 is used in fields such as material science, semiconductor manufacturing, and thin film technology. It is ideal for applications requiring precise multilayer coating of conductive metal films, such as in electronics, solar cells etc.

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Available Range :

Plasma Sputtering Coater LPSC-A10 : 100 mm Magnetron Coating Machine LMMC-A13 : Ф 150 mm Magnetron Coating Machine LMMC-A12 : Ф 50 mm