Plasma Sputtering Coater LPSC-A11

Name: Plasma Sputtering Coater LPSC-A11
Brand: Labtron
SKU: LPSC-A11
Rating: 4.9 (989 reviews)

Plasma Sputtering Coater LPSC-A11 supports samples with a diameter of up to 100 mm. It incorporates a heating sample stage for which the temperature can reach up to 500℃ for better adhesion. The temperature is precisely controlled with PID control ensuring an accuracy of ± 1℃. Its water cooling system prevents overheating during extended sessions. Our coater is ideal for precise and demanding sputtering processes.

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Sample Stage Size	100 mm
Sample Stage Rotating Speed	1 to 20 rpm adjustable
Sample Stage Heating Temperature	≤ 500℃
Sample Stage Temperature Control Method	PID temperature control
Temperature Control Accuracy	± 1℃
Plasma Sputtering Source Quantity	2 inches x 1 target
Plasma Sputtering Source Cooling Method	Water cooling
Vacuum Chamber Size	Ф 180 × 200 mm
Vacuum Chamber Observation Window	Omnidirectional visibility
Vacuum Chamber Material	High purity quartz
Vacuum Chamber Open Method	Top cover removable
Vacuum Chamber Cover Material (Upper And Lower)	304 SUS
Vacuum Chamber Pumping Port	KF25
Vacuum Chamber Intake Port	1/4 inch ferrule connector
Vacuum System Pump Type	Dual-stage rotary vane vacuum pump
Vacuum System Pumping Rate	1.1 L/s (4 m³/h)
Vacuum System Ultimate Vacuum Pressure	≥ 0.1 Pa
Vacuum System Vacuum Measurement	Resistance vacuum gauge
Vacuum System Pumping Port	KF25
Vacuum System Exhaust Interface	KF16
Plasma Sputtering Power Supply	3000 V, DC
Output Power of DC Power Supply	≤ 150 W
Maximum Sputtering Current	0.05 A
Power Supply	AC 220V, 50Hz
Total Power	1.5 kW/ 2kW
Dimension	570 × 450 × 550 mm
Weight	30 kg

High-purity quartz vacuum chamber
Omnidirectional visibility
PLC control system
Rotatable heating sample stage
Compact size
Easy operation

Plasma Sputtering Coater LPSC-A11 is used for thin-film deposition in applications like SEM sample preparation, metal coating, and optical coatings. It provides uniform coatings with improved adhesion, ideal for research, semiconductor, and materials science experiments.

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Available Range :

Plasma Sputtering Coater LPSC-A10 : 100 mm Magnetron Coating Machine LMMC-A13 : Ф 150 mm Magnetron Coating Machine LMMC-A12 : Ф 50 mm

Plasma Sputtering Coater LPSC-A11|Omnidirectional visibility|PLC control system

Plasma Sputtering Coater LPSC-A11|Vacuum Chamber Material High-purity quartz|Cooling Method Water cooling

Models of Coating Machine

Labtron provides a wide range of Coating Machines such as Tablet Coating Machine, Blade Coaters, and Vacuum Spin Coaters. They ensure precise and uniform application of coatings on various substrates, enhancing product performance and quality. Their features like adjustable coating thickness, customizable speed, and advanced digital controls, make them useful for a variety of applications. These coating machines are engineered for efficiency, reliability, and consistency. Our machines are tailored to meet the unique needs of each industry, improving productivity and delivering superior results.