Magnetron Coating Machine LMMC-A11 has a bottom-mounted target design with a sample stage size of 100 mm. It has an advanced vacuum system to achieve a vacuum level of ≤5×10⁻⁴ Pa. The rotatable sample stage can heat up to 500℃ and rotate at speeds between 0 to 20 rpm, ensuring uniform and well-adhered coatings. Its vacuum chamber is equipped with a Ф 60mm watch window. Our coating machine is perfect for precise and uniform thin film coatings.
| Sample Stage Size | 100 mm |
| Sample Stage Heating Temperature | ≤ 500℃ |
| Sample Stage Rotating Speed | 1 to 20 rpm adjustable |
| Magnetron Sputtering Head Diameter | Ф 50.8 mm |
| Magnetron Sputtering Head Thickness | ≤ 3 mm |
| Vacuum Chamber Size | Ф 180 × 215 mm |
| Vacuum Chamber Observation Window | Ф 60 mm |
| Vacuum Chamber Material | 304 SUS |
| Vacuum Chamber Opening Mode | Removable cover |
| Vacuum System Backing Pump Type | Low noise two-stage rotary vane pump |
| Vacuum System Molecular Pump Type | Low noise and high pumping speed turbomolecular pump |
| Backing Pump Pumping Rate | 1.1 L/s |
| Molecular Pump Pumping Rate | 600 L/s |
| Vacuum System Ultimate Vacuum Pressure | ≤ 5 × 10-4 Pa |
| Vacuum System Vacuum Measurement | Resistance gauge + ionisation gauge |
| Vacuum System Air Extraction Interface | KF16, KF40 |
| Vacuum System Exhaust Interface | KF16 |
| Target Power Supply | DC 300 W |
| Target Power Supply Quantity | 1 |
| Overall Power Supply | AC 220V, 50Hz |
| Total Power | 2 kW |
| Dimension | 550 × 350 × 400 mm |
Controlled sputtering environment
304 stainless steel vacuum chamber
Advanced Monitoring
High-quality vacuum system
Uniform coating
Durable construction
Compact design
Magnetron Coating Machine LMMC-A11 is primarily used for metal sputtering and thin-film deposition. It is ideal for applications requiring low temperature rise and fast deposition speeds.
Labtron Equipment Ltd., Quatro House, Lyon Way, Camberley, Surrey GU16 7ER United Kingdom
Email: info@labtron.com Whatsapp: +44 73 4441 2688 Phone: +44 2080 043608